I

Development of a Novel Dry-Film Resist Process for Wafer-to-Wafer Bonding

icon building Company : Imec
icon briefcase Job Type : Internship

Number of Applicants

 : 

000+

Click to reveal the number of candidates who applied for this job.
icon loader
icon loader

Let AI Supercharge Your Job Hunt!

JobCopilot scans 500,000+ company career sites daily to find jobs for you

Never miss an opportunity Save hours by auto-filling applications forms Land more interviews with tailored applications
happy man
thunder iconActivate JobCopilot

Job Description - Development of a Novel Dry-Film Resist Process for Wafer-to-Wafer Bonding

Internshiptopic: Development of a Novel Dry-Film Resist Process for Wafer-to-WaferBonding

Dailysupervisor: Clement Leruth ( < email deleted for security reasons >)

Internshipintroduction

Microfluidics hasbecome a cornerstone technology for modern biomedical, chemical, andenvironmental applications. This technique has been enabling precise control offluids at the microscale with reduced sample volumes and faster analysis times.The performance and reliability of microfluidic devices strongly depend on thequality of their fabrication, which remains a major technical challenge.

Achievinghigh-resolution patterns, reproducibility, and robust sealing is particularlydifficult as device architectures become more complex. Fabrication constraintsoften limit scalability, material compatibility, and integration of newfunctionalities. To address these challenges, we open this internship todevelop a process using a novel dry film resist for microfluidic applications.This work will focus both on improving developing a recipe for this novel resistand optimise the development for wafer-to-wafer bonding. This internship offersyou an unique opportunity to work in a team centered on lab scaled developmentof diverse devices on micro scale.

Techniques to belearned: Microfabrication, lamination, photolithography, wafer to waferbonding.

Type of project:Master internship

Duration: 3 months

Location: Imec 1 Heverlee

Type of internship: Master internship

Duration: 3 months

Required educational background: Chemistry/Chemical Engineering, Nanoscience & Nanotechnology, Materials Engineering, Bioscience Engineering, Biomedical engineering, Physics

Supervising scientist(s): For further information or for application, please contact Alexey Podkovskiy (< email deleted for security reasons >) and Clement Leruth (< email deleted for security reasons >) and Ben Jones (< email deleted for security reasons >)

The reference code for this position is 2026-INT-012. Mention this reference code in your application.

Only for self-supporting students.

Applications should include the following information:
  • resume
  • motivation
  • current study

Incomplete applications will not be considered.

Application deadline

As long as the job is online

Study level

Master level or equivalent

Job Category

Technology
Original job Development of a Novel Dry-Film Resist Process for Wafer-to-Wafer Bonding posted on GrabJobs ©. To flag any issues with this job please use the Report Job button on GrabJobs.
Share Job
Share Job

Auto-Apply to Development of a Novel Dry-Film Resist Process Jobs with your AI JobCopilot

thunder icon Auto-Apply with AI

Similar Development of a Novel Dry-Film Resist Process Jobs in Belgium

GrabJobs is the no1 job portal in Belgium, connecting you to thousands of jobs fast! Find the best jobs in Belgium, apply in 1 click and get a job today!

Mobile Apps

Copyright © 2026 Grabjobs Pte.Ltd. All Rights Reserved.