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Soft X-ray/EUV plasma simulation for microscopic metrology

Job Description - Soft X-ray/EUV plasma simulation for microscopic metrology

This project aims to explore nonlinear optical phenomena occurring in hot, dense plasmas generated from gas targets using both laser-induced and discharge-produced methods. The research will contribute to fundamental understanding and advancement of plasma-light interaction in extreme conditions, relevant for application of high-resolution microscopy useful for metology, and plasma-based light sources generation. The project will combine literature reviews and simulation work, with a focus on optimizing plasma generation and emission characteristics from gas targets.

Type of internship: Master internship

Required educational background: Nanoscience & Nanotechnology, Physics

Supervising scientist(s): For further information or for application, please contact Hyun-su Kim ([email protected])

The reference code for this position is 2026-INT-100. Mention this reference code in your application.

Applications should include the following information:
  • resume
  • motivation
  • current study

Incomplete applications will not be considered.

Application deadline

As long as the job is online

Study level

Master level or equivalent

Job Category

Technology
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