Develop physics‑based feature‑scale models of plasma deposition and etch processes using SEMulator3D®, incorporating key physical mechanisms into the models. Analyze simulation outputs and compare predicted results with experimental measurements in partnership with process engineering teams. Identify gaps or mismatches between simulated and experimental trends and propose model refinements. Collaborate with software developers to improve workflow robustness and ease‑of‑use. Prepare clear visualizations, summaries, and technical documentation to communicate modeling results and insights. Participate in technical discussions and design reviews to improve methodology and modeling best practices. Contribute to internal knowledge sharing by documenting learnings, challenges, and recommended modeling strategies. Minimum MS in Physics, Chemistry, Material Science or related fields Strong foundational understanding of plasma physics, semiconductor processing, and reaction kinetics. Familiarity with ion/radical transport, sheath behavior, and plasma-surface interaction mechanisms. Strong analytical thinking and attention to detail when interpreting experimental and simulated data. Ability to communicate complex technical concepts clearly, both verbally and in writing Excellent people skills with demonstrated ability to work effectively and efficiently with diverse teams, customers, internal and external partners. Coursework or prior experience in plasma deposition/etch, process modeling, or virtual fabrication. Experience with scientific programming or data analysis tools (e.g., Python, MATLAB). Exposure to SEM, TEM, EDS, or metrology data interpretation. Experience with feature‑scale or reactor‑scale simulations.
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